← 返回
基于P3HT:PCBM界面的SiC肖特基二极管中势垒非均匀性在宽温度范围内的分析
Analysis of barrier inhomogeneity in SiC schottky diodes with P3HT: PCBM interfaces over a wide temperature range
| 作者 | Tamer Güzel |
| 期刊 | Journal of Materials Science: Materials in Electronics |
| 出版日期 | 2025年1月 |
| 卷/期 | 第 36.0 卷 |
| 技术分类 | 功率器件技术 |
| 技术标签 | SiC器件 |
| 相关度评分 | ★★★★ 4.0 / 5.0 |
| 关键词 | 肖特基二极管 金属-半导体界面 势垒高度 电流-电压特性 界面势垒不均匀性 |
语言:
中文摘要
由于金属-半导体界面对于肖特基二极管电学特性具有重要影响,相关研究持续受到关注。本研究制备了结构为Au/P3HT:PCBM/6H-SiC/Al的肖特基二极管,并在80–375 K的宽温度范围内分析了其电流-电压特性。利用这些特性,结合热电子发射模型、Cheung-Cheung函数和Norde函数,计算了二极管的理想因子(n)、势垒高度(Φb)、串联电阻(Rs)和饱和电流(Io)等参数,并考察了这些参数之间的相互关系。通过Richardson图提取了Richardson常数(A*)。此外,基于高斯分布模型对势垒非均匀性进行了分析。尽管势垒高度表现出随温度变化的双高斯分布特征,表明存在非均匀性,但电压形变效应在所有温度下均被确定为保持稳定。
English Abstract
Research on the metal–semiconductor interface continues due to its significant impact on the electrical characteristics of Schottky diodes. In this study, a Schottky diode with the structure Au/P3HT: PCBM/6H–SiC/Al was fabricated, and its current–voltage characteristics were analyzed over a wide temperature range of 80–375 K. Using these characteristics, the ideality factor ( n ), barrier height ( Φ b ), resistance (Rs), and saturation current ( I o ) parameters of the diode were calculated with the help of the Thermionic emission model, Cheung-Cheung, and Norde functions. The correlation between these parameters was also examined. The Richardson constant ( A *) was determined using the Richardson plot. Furthermore, the barrier inhomogeneity was analyzed based on a Gaussian distribution model. Although the barrier height has an inhomogeneity showing a double Gaussian distribution that varies with temperature, the effect of voltage deformation was determined to be stable at all temperatures.
S
SunView 深度解读
该SiC肖特基二极管界面特性研究对阳光电源功率器件应用具有重要价值。研究揭示的势垒不均匀性及温度特性分析,可指导ST系列储能变流器和SG系列光伏逆变器中SiC器件的选型与热设计优化。宽温区(80-375K)电流-电压特性数据为三电平拓扑中SiC二极管的可靠性评估提供理论依据,有助于提升PowerTitan储能系统和充电桩产品在极端工况下的效率与寿命。势垒高度与理想因子的关联分析可优化器件并联均流设计,支撑高功率密度变流器开发。