磁控溅射NiOx用于钙钛矿太阳能电池

Perovskite solar cells(PSCs)have become a hot topic in the field of renewable energy due to their excellent power conversion efficiency and potential for low-cost manufacturing.The hole transport layer(HTL),as a key component of PSCs,plays a crucial role in the cell's overall performance.Magnetron sputtering NiOx has attracted widespread attention due to its high carrier mobility,excellent stability,and suitability for large-scale production.Herein,an insightful summary of the recent progress of magnetron sputtering NiOx as the HTL of PSCs is presented to promote its further development.This review summa-rized the basic properties of magnetron sputtering NiOx thin film,the key parameters affecting the optoelectronic properties of NiOx thin films during the magnetron-sputtering process,and the performance of the corresponding PSCs.Special attention was paid to the interfacial issues between NiOx and perovskites,and the modification strategies were systematically summa-rized.Finally,the challenges of sputtering NiOx technology and the possible development opportunities were concluded and dis-cussed.