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重复短路应力下p-GaN栅HEMT的短路能力与器件不稳定性研究

Study of the Short-Circuit Capability and Device Instability of p-GaN Gate HEMTs by Repetitive Short-Circuit Stress

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中文摘要

本文研究了肖特基型p-GaN栅高电子迁移率晶体管(HEMT)在不同应力参数下的重复短路(SC)退化行为。首次记录并分析了器件特性的恢复动力学,揭示了其退化机制。研究发现,在重复短路应力下,器件表现出显著的阈值电压(VTH)漂移等不稳定性。

English Abstract

In this article, the device degradation of Schottky-type p-GaN gate high electron mobility transistors was studied under repetitive short circuit (SC) with various stress parameters. Moreover, for the first time, the device characteristics recovery kinetics were recorded and analyzed to reveal the device degradation mechanism. During the repetitive SC stress, prominent threshold voltage (VTH) shif...
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SunView 深度解读

GaN器件作为宽禁带半导体的代表,在阳光电源的高功率密度户用逆变器及小型化充电桩产品中具有巨大的应用潜力。本文揭示的p-GaN栅HEMT在重复短路下的退化机制及恢复动力学,对于优化阳光电源产品的驱动电路设计、短路保护策略及器件选型具有重要参考价值。建议研发团队在开发下一代高频、高效电力电子变换器时,重点评估GaN器件在极端工况下的可靠性边界,并据此优化保护电路的响应速度,以提升产品在复杂电网环境下的长期运行稳定性。