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功率器件技术 GaN器件 ★ 4.0

中子辐照对GaN高电子迁移率晶体管重离子诱导漏电流退化影响的研究

Study on the Influence of Neutron Irradiation on Heavy-Ion-Induced Leakage Degradation in GaN HEMTs

作者 Weixiang Zhou · Dongping Yang · Yuanyuan Xue · Rongxing Cao · Chengan Wan · Xuelin Yang
期刊 IEEE Transactions on Electron Devices
出版日期 2025年6月
技术分类 功率器件技术
技术标签 GaN器件
相关度评分 ★★★★ 4.0 / 5.0
关键词 中子辐照 重离子辐照 漏电流退化 p-GaN HEMT 抑制效应
语言:

中文摘要

本研究探究了中子辐照对 p - GaN 栅高电子迁移率晶体管(HEMT)中重离子诱发的泄漏退化的影响。进行了不同能量的中子辐照实验,结果显示阈值电压(<inline - formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex - math notation="LaTeX">${V}_{\text {TH}}$ </tex - math></inline - formula>)正向漂移,输出饱和漏极电流(<inline - formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex - math notation="LaTeX">${I}_{\text {DS}}$ </tex - math></inline - formula>)减小。随后进行了钽离子辐照实验,以研究辐照过程中的泄漏电流退化情况。我们观察到,与未进行中子辐照的器件相比,预先经过中子辐照的器件在重离子辐照期间的泄漏退化较弱,这表明中子辐照对重离子诱发的泄漏退化具有抑制作用。利用技术计算机辅助设计(TCAD)和 GEometry ANd Tracking 4(Geant4)进行了模拟,以阐明其潜在机制。结果表明,中子辐照会在 GaN 器件中引入受主型陷阱,降低重离子辐照期间产生的电子浓度,从而抑制漏极泄漏电流(<inline - formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex - math notation="LaTeX">${I}_{\text {D}}$ </tex - math></inline - formula>)。此外,观察到辐照期间的晶格温度和碰撞产生率降低,这阻碍了泄漏路径的形成,并减轻了漏极区域的损伤。本研究首次观察到中子辐照对 GaN 器件中重离子诱发的泄漏退化具有抑制作用,从而为提高 GaN HEMT 抗泄漏退化的辐射硬度提供了理论基础。

English Abstract

This study investigates the influence of neutron irradiation on the heavy-ion-induced leakage degradation in p-GaN gate high electron mobility transistors (HEMTs). Neutron irradiation experiments at different energies were conducted, revealing a positive shift in the threshold voltage ( V_ TH ) and a reduction in the output saturation drain current ( I_ DS ). Subsequent Ta-ion irradiation experiments were conducted to investigate the leakage current degradation during the irradiation process. We observed that devices pre-irradiated with neutrons exhibit weaker leakage degradation during heavy-ion irradiation compared to unirradiated devices, suggesting a suppression effect of neutron irradiation on heavy-ion-induced leakage degradation. Simulations using technology computer-aided design (TCAD) and GEometry ANd Tracking 4 (Geant4) were performed to elucidate the underlying mechanisms. The results revealed that neutron irradiation introduces acceptor-like traps in GaN devices, reducing the electron concentration generated during heavy-ion irradiation, thereby suppressing drain leakage current ( I_ D ). Furthermore, the lattice temperature and impact generation rate during irradiation were observed to decrease, hindering the formation of leakage paths and mitigating damage in the drain region. This study represents the first observation of neutron irradiation suppressing heavy-ion-induced leakage degradation in GaN devices, thus providing a theoretical foundation for improving the radiation hardness of GaN HEMTs against leakage degradation.
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SunView 深度解读

从阳光电源的业务视角来看,这项关于GaN HEMT器件抗辐射性能的研究具有重要的战略参考价值。GaN功率器件因其高频、高效、高功率密度特性,已成为我们新一代光伏逆变器和储能变流器的核心技术方向,但其在极端环境下的可靠性一直是工程应用的关键考量。

该研究揭示的中子辐照对重离子诱导漏电退化的抑制效应,为GaN器件的抗辐射加固提供了新思路。研究发现中子辐照会在GaN中引入受主型陷阱,降低重离子辐照时的电子浓度,从而抑制漏电流并减轻漏极区域损伤。这一机制对于我们在高海拔、强辐射环境(如青藏高原光伏电站)部署的设备具有实际意义,也为航天级、特种应用场景的产品开发提供了理论基础。

从技术成熟度评估,该研究仍处于基础科学阶段,距离工程应用尚有距离。主要挑战在于:首先,中子预辐照虽能提升抗重离子性能,但本身会导致阈值电压正向漂移和饱和电流下降,这对器件的正常工作特性构成负面影响,需要在加固效果与性能损失间寻求平衡;其次,中子辐照的工艺可控性、成本效益及与现有生产线的兼容性都需要深入评估。

对阳光电源而言,短期内可将此研究成果纳入GaN器件选型的可靠性评估体系,优化高辐射环境下的器件筛选标准;中长期则可探索与上游GaN器件供应商合作,开发针对特殊应用场景的定制化抗辐射方案,在卫星电源、深空探测等新兴市场建立技术壁垒,拓展业务边界。