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拓扑与电路
★ 4.0
电沉积FeNiWMoMn高熵合金:合成、表征及退火处理
Electrodeposited FeNiWMoMn high-entropy alloys: synthesis, characterization, and annealed
| 作者 | Springer Nature remains neutral with regard to jurisdictional claims in published maps · institutional affiliations. |
| 期刊 | Journal of Materials Science: Materials in Electronics |
| 出版日期 | 2025年1月 |
| 卷/期 | 第 36.0 卷 |
| 技术分类 | 拓扑与电路 |
| 相关度评分 | ★★★★ 4.0 / 5.0 |
| 关键词 | 高熵合金 电沉积法 退火处理 磁性能 结构表征 |
语言:
中文摘要
采用电沉积方法在铜基体上于水溶液中制备了FeNiWMoMn高熵合金(HEA)涂层。沉积温度设定为75 °C,电流密度恒定为1 A/dm²,沉积时间分别为30 min、60 min和90 min。将沉积60 min的样品在200 °C下退火1小时,以研究其对磁性和结构性能的影响。利用X射线衍射(XRD)、场发射扫描电子显微镜(FESEM)、能量色散X射线光谱(EDS)和电化学阻抗谱(EIS)对FeNiWMoMn合金涂层进行了表征。X射线衍射分析结果表明,该合金呈现立方晶体结构。晶粒尺寸在沉积时间为30 min、60 min和90 min时分别测得为27 nm、26 nm和25 nm。退火处理导致晶粒尺寸增大且位错密度降低,从而有助于改善材料的力学性能。EDS结果证实样品中含有所有目标元素。随着沉积时间的延长,Ni和Fe的原子质量百分比增加,而W和Mn则减少。涂覆的FeNiWMoMn高熵合金的腐蚀速率随沉积时间的增加而升高,极化电阻值开始下降。经过退火处理后,腐蚀速率降低,极化电阻提高。还通过原子力显微镜(AFM)研究了所合成合金的表面粗糙度特性,发现随着沉积时间的增加,FeNiWMoMn合金的表面粗糙度减小。退火处理能够改善Ni–Fe–W–Mo–Mn薄膜在先进应用中的综合性能。
English Abstract
The electrodeposition method was used for FeNiWMoMn – High-entropy alloy (HEA) coating on a Copper substrate in an aqueous medium. The temperature was set at 75 °C and the deposition time was varied as 30 min, 60 min, and 90 min with a constant current density of 1A/dm 2 . The 60-min deposited films were exposed to one hour of annealing at 200 °C to study the effects on their magnetic and structural properties. FeNiWMoMn alloy coatings were characterized using X-ray diffraction (XRD), Field Emission Scanning Electron Microscopy (FESEM), Energy Dispersive X-ray spectroscopy (EDS) and Electrochemical Impedance Spectroscopy (EIS). From the X-ray diffraction analysis, it was observed that they exhibit a cubic crystal structure. The crystalline size measured 27 nm, 26 nm, and 25 nm for deposition times of 30, 60, and 90 min, respectively. Annealed indicates increased crystallite size and reduced dislocation density, contributing to improved mechanical properties. The EDS results confirm that the sample has all of the required elements. The atomic weight percentage of Ni and Fe increases as the deposition period increases, whereas W and Mn decrease. The corrosion rate of coated FeNiWMoMn high-entropy alloy increases as the deposition time increases. The polarization resistance values start to decrease. After Annealing corrosion rate decreased and polarization resistance increased. The surface roughness properties of synthesized alloy are also investigated using AFM and found that the surface roughness of FeNiWMoMn alloy reduces as deposition time increases. Annealing improves the properties of Ni–Fe–W–Mo–Mn thin films for advanced applications.
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SunView 深度解读
该FeNiWMoMn高熵合金电镀技术对阳光电源功率器件散热与电磁屏蔽具有应用价值。其纳米级晶粒结构(25-27nm)和优异的耐腐蚀性能可应用于ST系列PCS和SG逆变器的铜基母排表面改性,提升高温高湿环境下的可靠性。退火工艺降低位错密度、提高极化电阻的特性,可优化储能系统PowerTitan的电气连接件长期稳定性。该合金镀层技术为充电桩和电驱系统的大电流铜排保护提供新方案,延长设备寿命并降低维护成本。